

NT-MDT Co. launches a new SCM system to Market. 12.05.2005 A unique Contact Scanning Capacitance Microscopy system is now available.
NT-MDT Co. has developed a unique technique (patent pending) to acquire SCM images and to carry out C-V è dC/dV-V spectroscopic measurements on semiconductor and ferroelectric samples.
A special probe holder of an original design was developed to implement this technique. Now, comparing with other similar devices available on the market, the influence of the parasitic capacitance on the capacitance image obtained during scanning can be reduced by several orders of magnitude. This in turn allows us to carry out measurements both on flat samples and on cleavages.
The new system employs a capacitance sensor of 0.1 aF sensitivity which allows us to study concentration distributions of carriers within a dynamic range of 5 orders of magnitude.
In contrast to other systems available on the market, which use the method of capacitance modulation for the acquisition of capacitance image, our method of parasitic capacitance compensation allows us not to use microwave generators in the system and carry out capacitance measurements at 10 MHz frequency. This facilitates preparations for measurements significantly.
The new SCM measuring head is compatible with our NTEGRA and Solver SPM systems.
Examples of our test measurements.
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Topography of a test structure |
Line scan of the topographic height |
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dC/dV image of the same area |
Line scan of the dC/dV signal |
SCM system workplace

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