Modular composition of the NanoFab 100 platform

Presently the NanoFab 100 platform contents more than 30 modules, which are divided into four basis groups.

Modules for local techniques are intended for processes of sequential local modifications of surfaces with the use of ion beams and tip probes, including the growth processes, etching, deposition, implantation etc. Amongst those are

• Focused ion beams ultra-high vacuum module (UHV FIB module)
• Ultra-high vacuum module for local focused ion beam implantations (UHV FIB Imp module)
• Focused ion beams ultra-high vacuum module with a system of gas injectors (FIB CVD module)
• Ultra-high vacuum module with a scanning probe microscope and a system of gas injectors (GIS SPM module)

Modules for batch techniques are intended to perform technology processes simultaneously over the whole surface of the substrate. They include the processes of deposition, etching and growth. Amongst those are

• Pulsed laser deposition module (PLD module)
• Plasma etching module (PE module)
• Plasma enhanced deposition module (PED module)
• Plasma cleaning module (PC module)
• GaAs molecular beam epitaxy module (MBE GaAs module)
• GaN molecular beam epitaxy module (MBE GaN module)

Control, measurement and analytical modules are intended for measurement and control of parameters of the structures fabricated. Amongst those presently are

• Scanning probe microscope ultra-high vacuum module (UHV SPM module)
• Scanning electron microscope ultra-high vacuum module (SEM module)

Auxiliary modules are intended for loading/unloading, transportation and intermediate storage of samples, and, also, for other procedures not directly related to the technology operations and research. Amongst those are

• Ultra-high vacuum radial distribution center / module (RDC module)
• Loading module for batch techniques (FDL module)
• Face-up loading module for local techniques (FUL module)
• Ultra-high vacuum module for sample storage, revolution, transportation (SSRT module)