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Scanning probe Microscopy |
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STM/ AFM (contact + semi-contact + non-contact) / Lateral Force Microscopy / Phase Imaging/Force Modulation/ Adhesion Force Imaging/ Magnetic Force Microscopy/ Electrostatic Force Microscopy/ Scanning Capacitance Microscopy/ Kelvin Probe Microscopy/ Spreading Resistance Imaging/ Lithography: AFM (Force and Current), STM |
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Specification |
Scan type |
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Scanning by sample |
Scanning by probe* |
| Sample size |
Ambient environment |
Up to 40 mm in diameter, to 15 mm in height |
Up to 100 mm in diameter, up to 15 mm in height |
|
Heating or cooling |
10x10x1.5 mm 15x12x1.5 mm |
Up to 15x17x1.5 mm |
| XY sample positiniong range |
5x5 mm |
| Positioning resolution |
readable resolution-5 um sensitivity-2 um |
|
Temperature control |
Range |
From -30°C to +80°C/RT – +150 C |
From RT to 300°C |
|
Stability |
±0.005 (typically),
±0.01°C |
±0.01°C (typically),
±0.02°C |
|
Scan range |
-30°C - +80°C |
10x10x5 um |
- |
|
Ambient conditions/ RT - +150°C |
100x100x10 um 3x3x2.6um |
50x50x5um |
|
RT - +300°C |
- |
50x50x5um |
|
DualScan™ mode |
Up to 150x150x15 um** (DualScan™ mode) |
|
Thermal drift*** (tipically) |
XY |
15 nm/°C |
|
Z |
10 nm/°C |
Non linearity, XY (with closed loop sensors) |
0.1%
|
0.15%
|
Noise level, Z (RMS in bandwidth 1000Hz) |
With sensors |
0.04 nm(typically),
0.06 nm |
0.06 nm(typically),
0.07 nm |
|
Without sensors |
0.03 nm |
0.05 nm |
Noise level, XY**** (RMS in bandwidth 200Hz) |
With sensors |
0.2 nm (typically),
0.3 nm (XY 100 um) 0.025 nm(typically),
0.04 nm (XY 10 um) |
0.1 nm (typically),
0.2 nm |
|
Without sensors |
0.02 nm(XY 100 um), 0.002 nm(XY 10 um), 0.001 nm (XY 3 um) |
0.01 nm |
| Linear dimension estimation error(with sensors) |
±0.5% |
±1.2% |
| Optical viewing system |
Optical resolution |
1 um/3 um |
3 um |
|
Field of view |
4.5-0.4 mm |
2.0-0.4 mm |
|
Continuous zoom |
available |
available |
|
Vibration isolation |
Active |
0.7-1000 Hz |
|
Passive |
above 1 kHz |