NANOFAB 100 platform: HV cluster for local and batch techniques
High vacuum cluster for local and batch techniques
This cluster contains:
- FIB GIS module - HV FIB GIS module
- SPM GIS module - HV SPM GIS module
- PLD module - pulsed laser deposition module
- RDC module - UHV radial distribution module
- LS module - Module for sample loading and storage
- RT module - UHV module for sample revolution and transportation
This cluster allows performing induced local processes of gas deposition/etching. The use of focused ion beams and tip probes secures localization of the processes.
The pulsed laser deposition module provides various substrates with the highest level of clearness and it allows operating focused ion beams in ultra-high vacuum, which secures the highest level of clearness of the structures fabricated. The presence of a GIS SPM provides control of the structures fabricated with sub-nanometer resolution.
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