NANOFAB 100 platform: HV cluster for local and batch techniques

High vacuum cluster for local and batch techniques

This cluster contains:

• Focused ion beams ultra-high vacuum module with a system of gas injectors (FIB CVD Module)
• Scanning probe microscope ultra-high vacuum module with a system of gas injectors (GIS SPM Module)
• Pulsed laser deposition module (PLD Module)
• Ultra-high vacuum module for sample storage, revolution, transportation (SSRT module)
• Face-up loading module for local techniques (FUL module)
• Ultra-high vacuum radial distribution center/module (RDC module)
   

   This cluster allows performing induced local processes of gas deposition/etching. The use of focused ion beams and tip probes secures localization of the processes.

   The pulsed laser deposition module provides various substrates with the highest level of clearness and it allows operating focused ion beams in ultra-high vacuum, which secures the highest level of clearness of the structures fabricated. The presence of a GIS SPM provides control of the structures fabricated with sub-nanometer resolution.

• Cluster overall dimensions  - 300х470 cm.