NANOFAB 25 platform: PECVD module

General information Technical characteristics Overall dimensions 3D model

The plasma enhanced chemical vapor deposition (PECVD) module of NANOFAB 25 platform serves for growing thin films by PECVD technique and for plasma chemical etching of surfaces.
Besides, this module provides selective etching of materials through a mask to form a patterned topology.
Plasma processing is applicable to many materials used in micro- and nanoelectronics.